Syllabus for Introduction to Thin Film Technology
Open online course, Fall 2021 (PDF version)
Responsible: Doc Tomas Nyberg, Division of Solid-State Electronics, Department of Electrical Engineering, The Ångström Laboratory, 070 4250 790, email@example.com and Doc Tobias Törndahl, Division of Solar Cell Technology, Department of Materials Science and Engineering, The Ångström Laboratory, 018 471 7250, firstname.lastname@example.org
Dates and time: 19 Nov. – 20 Dec. 2021, 4 weeks
Virtual classroom: online on Zoom
Main fields of study: Engineering sciences, physics, material science, chemistry.
Participants: The course will target participants with a Bachelor degree in engineering, electronics, natural sciences, chemistry or a similar subject field. The lectures will assume no previous experience in thin film technology.
Course materials: Recorded material, slides, assignments, a limited number of articles
Maximal number of participants: 50
AIM AND SCOPE
The aim of this course is to provide the participants basic knowledge of thin film processing and the fundamental mechanisms responsible for the thin film growth. The course also intends to give understanding of the different deposition techniques and the relation between growth conditions and material properties. After completion of the course, the participants should be able to describe the different deposition techniques and understand the relation between growth conditions and the properties of the synthesized film. In particular, the participants should be able to
- explain the differences and similarities between different vacuum based deposition techniques,
- evaluate and use models for nucleating and growth of thin films,
- asses the relation between deposition technique, film structure, and film properties,
- identify typical thin film applications,
- motivate the selection of deposition techniques for various applications,
- assess possibilities and identify challenges in thin film deposition for a specific application.
The course includes eight lectures with the following main topics (1) introduction and overview of thin film technology, introduction to vacuum technology, (2) fundamentals of vacuum technology and plasma, (3) physical vapour deposition – evaporation (4) physical vapour deposition – sputtering, (5) , (6) chemical vapour deposition (7) chemical vapour deposition , atomic layer deposition (8) . Assignments follow lecture 5 and 8. Course certificates can be given to participants with a sufficient number of correct answers.
All the lecturing starts at 10.15. Each lecture is scheduled for 2*45 min.
|19 Nov||1. Introduction and overview of thin film technology, introduction to vacuum technology||Tomas|
|23 Nov||2. Fundamentals of vacuum technology and plasma||Tomas|
|26 Nov||3. Physical vapour deposition – evaporation||Tomas|
|30 Nov||4. Physical vapour deposition – sputtering||Tomas|
|3 Dec||5. Ionized physical vapour deposition||Tomas|
|7 Dec||6. Chemical vapour deposition||Tobias|
|10 Dec||7. Chemical vapour deposition , atomic layer deposition||Tobias|
|14 Dec||8. Atomic layer deposition||Tobias|
The course is mainly based on the following literatures:
- Handbook of Thin-Film Technology, Editors Hartmut Frey Hamid R. Khan, Springer-Verlag Berlin Heidelberg 2015, ISBN 978-3-642-05429-7
- Handbook of Deposition Technologies for Films and Coatings - Science, Applications and Technology, Editor Martin, Peter M., William Andrew Publishing, 2010, ISBN 978-0-8155-2031-3
- A User’s Guide to Vacuum Technology, John F. O’Hanlon, John Wiley & Sons, Inc, New York 1988, ISBN 0-471-81242-