Ongoing projects

NewSkin Innovation Eco-system to Accelerate the Industrial Uptake of Advanced Surface Nano-Technologies

Starts 2020, Ends 2024, Funding DT-NMBP-03-2019, Project ID 862100

The NewSkin project aims to create an Open Innovation Test Bed (OITB) to provide the European Innovation Ecosystem with the necessary resources to uptake a set of game changing innovative processes to manufacture nano-enabled industrial and consumer products. In this project, our group utilizes high power impulse magnetron sputtering (HiPIMS) for synthesis of oxides on flexible substrates. Our work includes also scaling deposition processes up to roll-to-roll in collaboration with Chromogenics AB.

web page: https://www.newskin-oitb.eu

BALBAS Fuel cells with aluminium as a base material

Starts 2022, Ends 2024, Funding Swedish Energy Agency, FFI Energi och miljö, Project No P2021-00373

We participate in a new project funded by the Swedish Energy Agency. In this project, academic and industrial partners will collaborate to develop lightweight fuel cells. Our responsibility is to develop physical vapour deposition techniques to provide high performance surface coatings.

Sputter deposition of 2D materials

We develop a sputter-deposition method for deposition of high quality two-dimensional layered sulphide structures, such as WS2, MoS2, SnS2 and combinations thereof. These materials are related to graphene and have potential use in several applications such as sensors, flexible electronics and solar cells.

Reactive High Power Impulse Magnetron Sputtering

Although magnetron sputtering is widely used for thin films deposition, the deposition flux consists predominantly of neutral atoms. When ions are employed during  the material synthesis, non-thermal energy may be delivered to the growing film and trigger various physical and chemical processes.

In order to significantly increase the ionization in magnetron sputtering, we use HiPIMS, a process where high power is applied in a pulsed manner. Typical peak power densities may reach kW/cm2 in HiPIMS, which is two orders of magnitude higher than in standard sputtering. The resulting high instantaneous plasma densities lead to high metal ionization.

Because of the complex interaction between plasma and surfaces, and the dynamic nature of the HiPIMS, the process physics is rather complex. We combine experiments and modelling to understand the process physics and develop novel deposition processes.

Last modified: 2022-06-21
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